Introduced new 300mm implant product suite. including the MC3 for medium current, the ULE3 for ultra-low energy and the HE3 for high energy applications
HE3 Ships to first 300mm fab
Implanter Network Options introduced, the industry’s first program to provide a state-of-the-art, cost-effective method of remotely monitoring and operating ion implantation equipment –precursor to remote diagnostics systems.
GSD/200E2 introduced. This is still being sold today as the GSD Ovation, which was relaunched in 2021
One of the bigger process challenges in this era was charge control, as the gate oxide thickness was such that it was very sensitive to charge breakdown. As a result, Eaton introduced the back biased Secondary Electron Flood (SEF) to provide charge control with low risk of emitting high energy primary electrons
8200P mid current implanter introduced, featuring innovative parallel scanning beam
NV-GSD is introduced and would go on to become the most successful high current implanter in the history of the industry with >600 units shipped in total, most of which are still in production. Featured unique Gyroscopic end station, the industry’s first two-axis tilt capability, for advanced processes and throughput of >200wph
NV-1002 high energy system introduced
NV-6200AV is introduced, with innovative platen design, rotation during processing and multiple tilt angles from 0 to 60 degrees
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