Purion XE Series | High Energy Ion Implantation

Products

High Energy

Purion XE Series high energy ion implanters

Our Purion XE series of ion implanters have rapidly earned a reputation as the industry standard for today’s demanding high energy recipes. Their unique RF Linear Accelerator (LINAC) technology offers higher reliability, a wider energy range and greater productivity than competing platforms, with superior metals contamination control.

Purity

The multi-filtration technology in our RF LINAC-based beamline filters out impurities other designs miss, achieving the industry’s lowest levels of metals and particulates contamination.

Precision

Proprietary Vector^TM control system uniquely provides in-situ horizontal and vertical measurement and correction, enabling zero-degree implants.

Productivity

Achieve throughput of up to 500 WPH, thanks to our high-speed Purion End Station and our RF LINAC-based beamline, offering the industry’s highest beam currents over the broadest energy range—from 40keV to 15MeV.

Optimize Your Energy Level

The Purion High Energy Series includes a variety of implanters, allowing you to select the optimal energy level for your application:

Purion XE—12-stage LINAC with energies up to 4.5 MeV
Purion EXE—12-stage LINAC with higher energy than Purion XE up to 5.25 MeV
Purion VXE—14-stage LINAC with energy booster, delivering energies up to 8 MeV
Purion XEmax—Dual LINAC design with patented Boost Technology^TM for the highest energies up to 15 MeV
Purion XE Power Series—XE and EXE models designed for high volume power devices aluminum implantation, 150mm SiC wafer handling or 200mm thin Si wafer handling