GSD/200E2 introduced. This is still being sold today as the GSD Ovation, which was relaunched in 2021
One of the bigger process challenges in this era was charge control, as the gate oxide thickness was such that it was very sensitive to charge breakdown. As a result, Eaton introduced the back biased Secondary Electron Flood (SEF) to provide charge control with low risk of emitting high energy primary electrons
8200P mid current implanter introduced, featuring innovative parallel scanning beam
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