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Materials Modiciation Implants for Advanced Devices

The Microwave Plasma Electron Flood

Preventing Metallic Contamination in Image Sensors

OptiScan, Beam Utilization Enhancement on the Purion XE (IIT 2014)

Damage Engineering on Purion XE High Energy Ion Implanter (IIT 2014)

Contamination Control in the Purion Platform Ion Implanters (IIT 2014)

Photomodulated Reflectance Measurement Technique For Implantation Tilt Angle Monitoring

Super Activation of Highly Surface Segregated Dopants in High Ge Content SiGe Obtained by Melt UV Laser Annealing

Materials Modification Implants for Dry Etch Process Optimization

Acceleration of 4+ Ions in an RF Linac Accelerator

Page 4 of 6«‹23456›»

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  • Home
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    • Overview
    • Advanced Logic
    • Image Sensors
    • Mature Process Technologies
    • Memory (DRAM and NAND)
    • Power Devices
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    • High Energy
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    • GSD Ovation
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