2009
- Optima HDx high dose implanter introduced, which brings unprecedented beam current and performance levels to the high dose space
2007
- Optima XE Introduced and becomes the technology leader in single wafer high energy ion implantation
2006
- Optima HD introduced, designed to address traditional high dose implants as well as the expanding range of applications in sub-65nm generation device manufacturing
2005
- Optima Family introduced, with launch of Optima MD medium current implanter
2002
- Axcelis opens $31 million advanced technology center. The 140,000-square-foot facility is dedicated to semiconductor manufacturing process development, equipment demonstration and customer training
- Axcelis strengthens commitment to China; Opens customer service and support center in Shanghai
- Axcelis extends reach into China’s semiconductor industry with acquisition of Tritek International
2001
- Eterna ELS Ion Source is introduced. Improved design promises extended source life, low cost of operation and high reliability for Axcelis ion implanters
- Axcelis ships 1000th GSD endstation; Industry standard for proven wafer-handling reliability, productivity
- Axcelis Technologies launches IntegraNET™ data integration and management platform; Provides framework for e-diagnostics and advanced process control
- Axcelis introduces HC3 high current implanter for 300mm manufacturing, completing the 300mm implant product family and meeting all implant application requirements beyond 100 nanometers
2000
- Eaton SEO is now Axcelis Technologies. Eaton corporation files registration statement to spin off Semiconductor Equipment Division, as Axcelis Technologies, Inc, in an IPO. Eaton completes total spin off of Axcelis Technologies in December.
- NV-8250HT Introduced, high-tilt, medium-current ion implanter introduced, designed for 0.18µm and below processes
