2001
- Eterna ELS Ion Source is introduced. Improved design promises extended source life, low cost of operation and high reliability for Axcelis ion implanters
- Axcelis ships 1000th GSD endstation; Industry standard for proven wafer-handling reliability, productivity
- Axcelis Technologies launches IntegraNET™ data integration and management platform; Provides framework for e-diagnostics and advanced process control
- Axcelis introduces HC3 high current implanter for 300mm manufacturing, completing the 300mm implant product family and meeting all implant application requirements beyond 100 nanometers
