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The Purion H is Axcelis’s next generation single wafer high current implanter.  As a member of the Purion ion implanter family, the Purion H ushers in a new era of yield-enabling ion implant technology.  The Purion H was designed to provide customers with an unprecedented level of process flexibility to address the modern challenges of the transition to 3D devices.  All Purion ion implanters feature the platform’s four common proprietary technology differentiators; Purion Contamination Shield, Purion Vector Dose and Angle Control System, Purion 500WPH endstation and t


The Purion XE next generation single wafer high energy implanter is the second tool in the expanding family of Purion ion implanters. An evolution of the industry leading Optima XEx, the Purion XE combines the process and productivity advantages of the Optima XEx linear accelerator and beamline technology with the reliability, precision, process flexibility, and performance options that define the Purion platform.


The Purion M is the only low energy, medium current ion implanter for all channel engineering applications in the low dose and mid dose regimes.


Axcelis' medium current implant product line gives customers the flexibility, precision and productivity for the widest array of low energy, mid dose applications, especially well, channel and HALO processes. The platform utilizes a patented angular energy filter, providing an exceptionally pure beam to ensure maximum performance while eliminating all forms of energy contamination.


Axcelis Technologies sets the standard for innovation in high energy implant technology, with the world's largest installed base and leading market share. The product line delivers the industry's highest productivity, superior reliability and lowest total cost for high volume production. Together, they are the only complete high energy solution capable of addressing all traditional and emerging high energy application requirements.


Axcelis' high current implant product line covers the entire spectrum of high dose ion implant applications, including planar and 3D devices.  All of our products are designed to provide you the highest level of productivity with the lowest cost of ownership. In addition, they provide maximum process versatility and extendibility to future technology nodes, to optimize the return on your equipment investment.


The Optima MDx is the only low energy, medium current ion implanter for all channel engineering applications in the low-dose and mid-dose regimes. The single wafer productivity-driven platform covers traditional medium current processes as well as emerging low energy mid-dose HALO implants and sub-MeV Well Implants.

  • Broad Energy Coverage. 0.5keV to 1MeV energy range covers a wide operating space, allowing versatility for production runs and advanced R&D on 2Xnm devices.


The Paradigm XE high energy, 300mm multi wafer platform offers the full range of implant energies matched to meet the changing needs of advanced logic and memory manufacturing.

  • Broad Energy Range. Through the use of its RF linear accelerator technology, the Paradigm XE provides flexibility for full applications coverage, including retrograde and deep well implants, low energy channel implants, and triple wells.


The Optima XEx is a 300mm, single wafer high energy ion implanter offering the full range of implant energies matched to meet the changing needs of today's advanced device manufacturing. The Optima XEx is the industry's most productive high energy ion implant tool.

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