Summit XT
The Summit XT is a single-wafer, hot-wall rapid thermal processing system that delivers inherently uniform, stable processing from <300°C to 1200°C. The system covers a broad range of advanced thermal processing needs for transistor formation in and beyond the 65nm technology node, including anneals for: ultra shallow junction formation, dry oxidation, nickel silicide, shallow trench isolation (STI) oxides and titanium nitride (TiN) densification.