Your Power to Perfect
More than 1,000 Axcelis upgrades are available to increase your productivity, improve yield, reduce cost of ownership, and extend your system's lifecycle. Each upgrade is designed to perfect your process and maximize the return on your capital investment.

GSD/200E² Productivity Enhancement Upgrade
Enhance your GSD/200 or GSD/200E to the performance level of the GSD/200E² with our GSD/200E² Productivity Enhancement Upgrade. Typically yielding a 20-60% increase in throughput for high dose, low energy implants, our GSD/200E² gives you the capability to manufacture advanced IC devices at 0.25 µm design rules.

With our GSD/200E² upgrade, you can avoid additional implanter purchases and leverage your existing equipment investment while you improve the low energy boron beam current, increase the electrode insulator lifetime, and simplify maintenance - all with a lower overall cost of ownership.

Extended Life Source
Boost productivity by reducing source maintenance and replacement frequency with our Extended Life Source upgrade. An industry breakthrough in source technology, the patented design of our ELS features an indirectly heated cathode in which the source filament has been removed from the harsh environment. As a result, the ELS more than doubles your source lifetime compared to a Bernas source.

Statistical Process Control
Eliminate manual data compilation with our Statistical Process Control (SPC) enhancement's automatic data collection capability. For proactive, predictable maintenance, simply install the SPC on the primary Sun workstation of your Axcelis implanter. Save valuable engineering time with the independent data filtration feature, which allows you to include or exclude individual runs for a given search criterion.

PEF-Xe (Xenon based Plasma Electron Flood System)
Our PEF-Xe enhancement simultaneously maximizes your productivity and gives you superior charge control performance over your full range of beam currents. The PEF-Xe protects charge-sensitive devices from the adverse effects of charge build-up at the water's surface and controls wafer charging by lowering beam-included voltage fluctuations across the wafer.

5-String Modular Gas Box
Our new 5-String Modular Gas Box upgrade satisfies your need for a fourth implant dopant within the gas box, giving you the convenience, versatility, and cost advantages associated with an additional, automatically-delivered and controlled gas.

Continuously Variable Aperture
Improve your system productivity with our Continuously Variable Aperture (CVA) enhancement for the GSD/HE series of ion implanters. By reducing beam tune times as much as 75%, our CVA lowers your overall cost of ownership by providing rapid recipe transitions, which are critical for the chained implant mode of operation. "Chaining" significantly increases your wafer throughput by implanting the same batch of wafers with multiple recipes, without removing them from the process disk.

Implanter Network Options
Looking for a state-of-the-art, cost-effective method of remotely monitoring and operating your implanters? Our Dedicated Network and In-House Network Options optimize your critical engineering time and increase your overall fab efficiency. Both options give you the benefits of fully networked implanters, by creating a local area network (LAN) that links multiple machines, or by building upon a fab's existing LAN. As a result, your process and maintenance engineers can edit recipes and access data from remote locations.

Stabil-Ion Gauge
In collaboration with Helix Technology Corporation, we have developed kits for implanter products that replace standard Bayard-Alpert glass gauges with state-of-the-art Stabil-Ion® gauges. These modern gauges have repeatedly shown superior results in the areas of pressure readout stability, gauge-to-gauge reproducibility and dose accuracy for implants utilizing pressure compensation (P-Comp), a feature on our high current and high energy ion implant systems. With Stabil-Ion® Gauge, your change out is less frequent, resulting in extended gauge lifetimes and increased system availability compared to conventional glass gauges.

TLHX - Triple Loop Heat Exchanger for GSD/HE_MC & GSD/HE Ion Implantation Systems
An alternative to our existing Triple Loop Chiller (TLC), our new Triple Loop Heat Exchanger TLHX gives you the necessary GSD/HE and GSD/HE_MC cooling capabilities without chemical refrigerants, while at the same time enhancing your reliability, ease of maintenance, and cost efficiency.

Threshold Activated Dose Control
This new dose algorithm allows for more uniform dosing and increased throughput for high power implants when significant photoresist outgassing occurs.

For more information about our productivity upgrades, please contact us directly.

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