The Paradigm and Paradigm XE are high energy, 300mm multi-wafer platforms offering the full range of implant energies matched to meet the changing needs of advanced logic and memory manufacturing.
  • Essential Energies. 10keV to 4MeV energy range provides flexibility for full applications coverage, including retrograde and deep well implants, low energy channel implants, and triple wells
  • Pure Beam. Patented RF LINAC beamline delivers unmatched beam purity through triple filtration of the ion beam
  • Maximum Productivity. Ultra-efficient chaining and rapid-tuning beamline capabilities boost productivity, with throughputs up to 400 wafers/hour – Low energy beam transport technology improves productivity in channel implants, including Vt adjust
  • Controlled Doping. Real-time dose control system enables uniform, repeatable doping
 


The Paradigm features the patented RF LINAC beamline which provides unmatched beam purity through triple filtration of the ion beam.

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