Complete Applications Coverage
Our evolving line comprises mid dose, high dose, and high energy platforms designed to address the continued scaling trends of implant applications to lower energy ranges. This means we have the technology to cover all critical implant applications - including all existing and emerging needs of the 65nm era and beyond. In addition, our platform is designed to provide a high degree of process overlap to provide both back up capability, and improved system ultilization.
Maximum Productivity and Yield
The scaling of implant energies means implant tools must be capable of addressing a changing array of productivity, contamination and angle control challenges in each new technology node. Every Axcelis implanter provides the highest productivity at the lowest energy - without introducing energy or particle contamination, so you get accurate, critical implant placements in uniform doses to the wafer.
Single and Multi Wafer Platforms
Because our customers know what's best for their particular set of applications, we offer both single and multi wafer platforms. No matter which configuration works for you, Axcelis supports your exacting technical, throughput and cost-of-ownership goals.