OPTIMA MDxt
The Optima MDxt is the only low energy, medium current ion implanter for all channel engineering applications in the low dose and mid dose regimes. The single wafer productivity-driven platform covers traditional medium current processes, as well as emerging low energy mid-dose HALO implants and sub-MeV Well Implants.
- Broad Energy Coverage. 0.5keV to 1MeV energy range covers a wide operating space, allowing versatility for production runs and advanced R&D on 2Xnm devices.
- Pure Beamline: Pencil beam optics, electrostatic scanning and beam parallelizing lens deliver pure and productive low energy performance.
- Maximize Yield. In-situ angle measurement and control capability coupled with Axcelis’ proprietary constant focal length scanning protects against yield loss.
- Boosts Productivity. Industry leading beam currents with production proven 500WPH end station enable industry’s highest productivity.
- Zero Energy Contamination. Patented angular energy filter eliminates all forms of energy contaminants.

Related Resources
Animation
Optima MDxt Throughput
View animation >
White Paper
Vertical Beam Angle Control
Read white paper >
White Paper
Implant Angle Control on the Optima MD
Read white paper >
White Paper
Implant Angle Repeatability on the Optima MD
Read white paper >
Applications
