Axcelis' high current implanter provides solutions for device manufacturing's lowest energy applications and highest dose requirements with the versatility and extendibility to provide solutions beyond today's 22nm technology node. The Optima HDx has been designed to maximize beam current, minimize beam setup time and delivers the most uniform, repeatable and productive process across the high dose applications space.
- Highest Beam Currents. The unique spot beam technology and short beamline delivers the industry's highest beam currents for maximum productivity
- Fastest Tune Times. Its patented AutoTune™ beam tuning system provides up to a 60% advantage over the competition, significantly increasing fab productivity.
- Best Across Wafer Uniformity. Innovative RadiusScan™ technology enables constant focal length scanning delivering the same beam profile and beam angle across the entire wafer. This results in superior implant uniformity and repeatability.
- Extendibility. The system's spot beam ensures the highest instantaneous dose rate, shown to reduce the implant damage profile and enhance device performance. The combination of dose rate with closed loop temperature control options extends its capabilities well beyond today's 22nm device requirements.