HIGH ENERGY IMPLANT
Axcelis Technologies sets the standard for innovation in high energy implant technology, with the world's largest installed base and leading market share. The product line, including the Optima XE Series of single wafer systems as well as the Paradigm Series of multi wafer systems, delivers the industry's highest productivity, superior reliability and lowest total cost for high volume production. Together, they are the only complete high energy solution capable of addressing all traditional and emerging high energy application requirements. Both systems utilize the production proven RF Linear Accelerator (LINAC) which delivers benchmark reliability and uptime performance.
- Optima XEx: The industry's most productive single wafer high energy system offers the full range of implant energies matched to meet the changing needs of today's advanced device manufacturing including DRAM, NAND and NOR FLASH, embedded memory, image sensor and logic device manufacturing.
- Paradigm Series: Combines the production proven RF LINAC, spot beam technology with a high-speed, multi wafer endstation, enabling exceptional productivity and industry benchmark uptime of >90%.
Related Resources
White Paper
Angle Performance on the Optima XE High Energy Implanter
Read white paper >
Presentation
Purion XE -Contamination Control
View presentation >
Animation
Axcelis RF Linac Beamline
View animation >
Applications
