HIGH ENERGY IMPLANT

Axcelis Technologies sets the standard for innovation in high energy implant technology, with the world's largest installed base and leading market share. The product line delivers the industry's highest productivity, superior reliability and lowest total cost for high volume production. Together, they are the only complete high energy solution capable of addressing all traditional and emerging high energy application requirements. All systems utilize the production proven RF Linear Accelerator (LINAC) which delivers benchmark reliability and uptime performance, and inherently filters out any impurities in the beam.

  • Purion XE: Axcelis’ next generation single wafer high energy implanter, the Purion XE combines the process and productivity advantages of the Optima XEx linear accelerator and beamline technology with the reliability, precision, process flexibility, and performance options that define the Purion platform.
  • Optima XEx: The industry's most productive single wafer high energy system offers the full range of implant energies matched to meet the changing needs of today's advanced device manufacturing including DRAM, NAND and NOR FLASH, embedded memory, image sensor and logic device manufacturing.
  • Paradigm Series: Combines the production proven RF LINAC, spot beam technology with a high-speed, multi wafer endstation, enabling exceptional productivity and industry benchmark uptime of >90%.