HIGH CURRENT IMPLANT
Axcelis' high current implant product line covers the entire spectrum of high dose ion implant applications. The Optima HDx is designed to provide you the highest level of productivity with the lowest cost of ownership. In addition, it is designed to provide maximum process versatility and extendibility to future technology nodes, to optimize the return on your equipment investment.
- Optima HDx: Axcelis' newest high dose, single wafer platform provides solutions for device manufacturing's lowest energy applications and highest dose requirements with the versatility and extendibility to provide solutions beyond today's 22nm technology node.
Related Resources
Animation
RadiusScan Beamline in Action
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White Paper
Integration of High Dose Boron Implants - Modification of Device Parametrics through Implant Temperature Control
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White Paper
Angle Performance on the Optima XE High Energy Implanter
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Applications
