The Optima XE is a high energy, 300mm single wafer implanter offering the full range of implant energies matched to meet the changing needs of advanced logic and memory manufacturing.
  • Broadest Energy Range. 10keV to 4MeV energy range provides complete applications coverage for retrograde well, triple well, isolation wells, and channel engineering implants.
  • Reliability. Utilizes the reliable production proven RF LINAC accelerator with an installed base of over 550 units worldwide.
  • Widest Single Charge Range. Shortest tune time and longest source life enable the highest available throughput.
 


The Optima XE features the patented RF LINAC beamline which provides unmatched beam purity.

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