The Optima MD is the only low energy, mid-dose ion implanter for all channel engineering applications in the low-dose and mid-dose regimes. The single wafer productivity-driven platform covers traditional medium current processes as well as emerging low energy mid-dose HALO implants. Broad Energy Coverage. 0.5keV to 750keV energy range covers a wide operating space, allowing versatility for production runs and advanced R&D on 65nm-32nm devices New Beamline. Pencil beam optics, electrostatic scanning and beam parallelizing lens deliver pure and productive low energy performance Maximize Yield. In-situ angle measurement capability protects against yield loss Boosts Productivity. Precise angle control enables throughputs of 350 wafers/hour at 300mm Zero Energy Contamination. Patented angular energy filter eliminates all forms of energy contaminants
	Back to Top