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The Optima MDx is the only low energy, medium current ion implanter for all channel engineering applications in the low-dose and mid-dose regimes. The single wafer productivity-driven platform covers traditional medium current processes as well as emerging low energy mid-dose HALO implants and sub-MeV Well Implants.

  • Broad Energy Coverage. 0.5keV to 1MeV energy range covers a wide operating space, allowing versatility for production runs and advanced R&D on 2Xnm devices.


The Paradigm XE high energy, 300mm multi wafer platform offers the full range of implant energies matched to meet the changing needs of advanced logic and memory manufacturing.

  • Broad Energy Range. Through the use of its RF linear accelerator technology, the Paradigm XE provides flexibility for full applications coverage, including retrograde and deep well implants, low energy channel implants, and triple wells.


The Optima XEx is a 300mm, single wafer high energy ion implanter offering the full range of implant energies matched to meet the changing needs of today's advanced device manufacturing. The Optima XEx is the industry's most productive high energy ion implant tool.


Axcelis' high current implanter provides solutions for device manufacturing's lowest energy applications and highest dose requirements with the versatility and extendibility to provide solutions beyond today's 22nm technology node. The Optima HDx has been designed to maximize beam current, minimize beam setup time and delivers the most uniform, repeatable and productive process across the high dose applications space.


Axcelis' legacy product offerings include both Rapid Thermal Processing (RTP) systems as well as UV Curing systems.

Summit XT: The system utilizes the company's patented hot wall heating technology to produce a stable, steady state environment in near equilibrium with the wafer, to achieve exceptional uniformity and repeatability. The system is ideally suited for applications where a reduced thermal budget is critical.


Axcelis is a recognized leader in FEOL and BEOL plasma cleaning and dry strip technology. Our systems are known worldwide for providing innovative process solutions, exceptional reliability and low cost of ownership.When it comes to cleaning and dry strip technology, each technology node brings new challenges for process engineers to overcome. New materials, device architectures, and plasma cleaning applications require a diverse set of process capabilities.


Enabling Ion Implantation Technology

Axcelis is recognized around the world as a leader in ion implantation with thirty five years of innovation and technology leadership. We manufacture a complete line of high current, high energy and medium current implanters for semiconductor device manufacturers worldwide. Our ion implanters support the ever growing global demand for semiconductors by enabling the production of the most advanced device technologies, planar or 3D.


At Axcelis, we make semiconductor manufacturing more productive every day. The company's product offering comprises a powerful suite of ion implantation systems, one of the most critical and enabling steps in the IC manufacturing process.  Chip manufacturers around the globe rely on Axcelis' tools and process expertise to form the transistors that are at the core of every semiconductor device.


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