WHITE PAPERS

Technical Publications:

IntelliScan, Real-Time Scan Waveform Correction for Dose Uniformity on Extreme Photoresist Implant Conditions with Optima XEx
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Improving Peak-To-Peak Wafer Non-Uniformity On High Power Implants Utilizing Axcelis IntelliScan On The Optima XEx
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Angle Performance on Purion M
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Enhanced Life Ion Source for Germanium and Carbon Ion Implantation
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Optimization of Cleanliness and Oxidization in Plasma Doped Photoresist Strip
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Effluent Management for Non-Oxidizing Plasma Strip Processes
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Evolution of Temperature Control in Ion Implantation
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Angle Performance on Purion M
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Integration of High Dose Boron Implants - Modification of Device Parametrics through Implant Temperature Control
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Angle Performance on the Optima XE High Energy Implanter
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Study of Controlled Oxygen Diffusion Approaches for Advanced Photoresist Strip
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Ion Implantation in Silicon Technology
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Extreme Outsourcing: Axcelis' New Manufacturing Strategy Aims to Lower Costs, Speed Time to Market
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